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|Title:||Binding state and microstructure analyses of Co-doped TiO 2 thin film||Authors:||Yao, X.F.
|Issue Date:||1-Jun-2004||Citation:||Yao, X.F., Zhou, T.J., Gai, Y.X., Chong, T.C., Wang, J.P. (2004-06-01). Binding state and microstructure analyses of Co-doped TiO 2 thin film. Journal of Applied Physics 95 (11 II) : 7375-7377. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1689432||Abstract:||The binding state, microstructure and diffusion behavior of multilayered Co-doped TiO 2 thin film were investigated, using x-ray photoelectron spectroscopy and transmission electron microscopy (TEM). The magnetron sputtering method was used for the deposition of thin films on a LaAlO 3 (001) single crystal substrate, at room temperature. Postannealing treatment in an ultrahigh vacuum system was used for the diffusion of Co atoms into TiO 2. The results from TEM patterns show that the annealed films exhibit a polycrystalline rutile-TiO 2 phase.||Source Title:||Journal of Applied Physics||URI:||http://scholarbank.nus.edu.sg/handle/10635/83513||ISSN:||00218979||DOI:||10.1063/1.1689432|
|Appears in Collections:||Staff Publications|
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