Please use this identifier to cite or link to this item: https://doi.org/10.1039/c3nr05034c
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dc.titleTuning of multifunctional Cu-doped ZnO films and nanowires for enhanced piezo/ferroelectric-like and gas/photoresponse properties
dc.contributor.authorOng, W.L.
dc.contributor.authorHuang, H.
dc.contributor.authorXiao, J.
dc.contributor.authorZeng, K.
dc.contributor.authorHo, G.W.
dc.date.accessioned2014-10-07T04:38:46Z
dc.date.available2014-10-07T04:38:46Z
dc.date.issued2014-02-07
dc.identifier.citationOng, W.L., Huang, H., Xiao, J., Zeng, K., Ho, G.W. (2014-02-07). Tuning of multifunctional Cu-doped ZnO films and nanowires for enhanced piezo/ferroelectric-like and gas/photoresponse properties. Nanoscale 6 (3) : 1680-1690. ScholarBank@NUS Repository. https://doi.org/10.1039/c3nr05034c
dc.identifier.issn20403364
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/83225
dc.description.abstractThe prospect of tuning and enhancing multiple properties of ZnO from optical, electrical, piezo to ferroelectricity/magnetism with Cu dopants will certainly spur the pursuit of facile doping methodology to immensely advance this field of research. Here, a one-step aqueous synthesis of Cu-doped ZnO nanostructured materials with effective controllability over the morphology (film to nanowire) and doping concentrations both on rigid and flexible substrates has been developed. High structural integrity Cu-doped ZnO films and nanowires were achieved without multiple/harsh post-processing which tends to degrade their functional properties. Comprehensive investigations of varying doping concentrations on the enhancement and tunability of room temperature piezo/ferroelectricity to gas/photosensing multifunctional properties were systematically reported for the first time. © 2013 The Royal Society of Chemistry.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1039/c3nr05034c
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.contributor.departmentMECHANICAL ENGINEERING
dc.description.doi10.1039/c3nr05034c
dc.description.sourcetitleNanoscale
dc.description.volume6
dc.description.issue3
dc.description.page1680-1690
dc.identifier.isiut000330041400060
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