Please use this identifier to cite or link to this item: https://doi.org/10.1021/nl802129f
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dc.titleSynthesis of silicon nanowires and nanofin arrays using interference lithography and catalytic etching
dc.contributor.authorChoi, W.K.
dc.contributor.authorLiew, T.H.
dc.contributor.authorDawood, M.K.
dc.contributor.authorSmith, H.I.
dc.contributor.authorThompson, C.V.
dc.contributor.authorHong, M.H.
dc.date.accessioned2014-10-07T04:37:45Z
dc.date.available2014-10-07T04:37:45Z
dc.date.issued2008-11
dc.identifier.citationChoi, W.K., Liew, T.H., Dawood, M.K., Smith, H.I., Thompson, C.V., Hong, M.H. (2008-11). Synthesis of silicon nanowires and nanofin arrays using interference lithography and catalytic etching. Nano Letters 8 (11) : 3799-3802. ScholarBank@NUS Repository. https://doi.org/10.1021/nl802129f
dc.identifier.issn15306984
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/83142
dc.description.abstractWe report results on the synthesis of silicon nanostructures that were fabricated using a combination of interference lithography and catalytic etching. With this technique, we were able to create nanostructures that are perfectly periodic over very large areas (1 cm 2 or more), where the cross-sectional shapes and the array ordering can be varied. Furthermore this technique can readily and independently control the sizes and spacings of the nanostructures down to spacings of 200 nm or less. These characteristics cannot be achieved using other known techniques. © 2008 American Chemical Society.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1021/nl802129f
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.contributor.departmentSINGAPORE-MIT ALLIANCE
dc.description.doi10.1021/nl802129f
dc.description.sourcetitleNano Letters
dc.description.volume8
dc.description.issue11
dc.description.page3799-3802
dc.identifier.isiut000260888600044
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