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https://doi.org/10.1109/TED.2007.915053
Title: | Strained n-MOSFET with embedded source/drain stressors and strain-transfer structure (STS) for enhanced transistor performance | Authors: | Ang, K.-W. Lin, J. Tung, C.-H. Balasubramanian, N. Samudra, G.S. Yeo, Y.-C. |
Keywords: | Lateral tensile strain n-MOSFET Silicon-carbon (Si:C) Strain-transfer structure (STS) |
Issue Date: | Mar-2008 | Citation: | Ang, K.-W., Lin, J., Tung, C.-H., Balasubramanian, N., Samudra, G.S., Yeo, Y.-C. (2008-03). Strained n-MOSFET with embedded source/drain stressors and strain-transfer structure (STS) for enhanced transistor performance. IEEE Transactions on Electron Devices 55 (3) : 850-857. ScholarBank@NUS Repository. https://doi.org/10.1109/TED.2007.915053 | Abstract: | A novel n-channel MOS transistor with a silicon-germanium (SiGe) heterostructure embedded beneath the channel and silicon-carbon source/ drain (Si:C S/D) stressors was demonstrated. The additional SiGe structure couples additional strain from the S/D stressors to the overlying Si channel, leading to enhanced strain effects in the channel region. We termed the SiGe region a strain-transfer structure due to its role in enhancing the transfer of strain from lattice-mismatched S/D stressors to the channel region. Numerical simulations were performed using the finite-element method to explain the strain-transfer mechanism. A significant drive current IDsat improvement of 40% was achieved over the unstrained control devices, which is predominantly due to the strain-induced mobility enhancement. In addition, the impact of scaling the device design parameters on transistor drive current performance was investigated. Guidelines on further performance optimization in such a new device structure are provided. © 2008 IEEE. | Source Title: | IEEE Transactions on Electron Devices | URI: | http://scholarbank.nus.edu.sg/handle/10635/83081 | ISSN: | 00189383 | DOI: | 10.1109/TED.2007.915053 |
Appears in Collections: | Staff Publications |
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