Please use this identifier to cite or link to this item:
https://doi.org/10.1021/am4014488
DC Field | Value | |
---|---|---|
dc.title | Solution-processed lif-doped ZnO films for high performance low temperature field effect transistors and inverted solar cells | |
dc.contributor.author | Chang, J. | |
dc.contributor.author | Lin, Z. | |
dc.contributor.author | Zhu, C. | |
dc.contributor.author | Chi, C. | |
dc.contributor.author | Zhang, J. | |
dc.contributor.author | Wu, J. | |
dc.date.accessioned | 2014-10-07T04:36:28Z | |
dc.date.available | 2014-10-07T04:36:28Z | |
dc.date.issued | 2013-07-24 | |
dc.identifier.citation | Chang, J., Lin, Z., Zhu, C., Chi, C., Zhang, J., Wu, J. (2013-07-24). Solution-processed lif-doped ZnO films for high performance low temperature field effect transistors and inverted solar cells. ACS Applied Materials and Interfaces 5 (14) : 6687-6693. ScholarBank@NUS Repository. https://doi.org/10.1021/am4014488 | |
dc.identifier.issn | 19448244 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/83033 | |
dc.description.abstract | This paper reports that high performance metal oxide thin film transistors (TFTs) can be achieved by using LiF-doped ZnO thin films processed from aqueous solution. It was found that LiF doping at an appropriate amount enhanced the oxide film carrier concentration. The TFTs based on the 10 mol % LiF-doped ZnO thin films annealed at 300 C revealed a good device performance with an average electron mobility of 8.9 cm2 V-1 s-1 and a high on/off current ratio of 4 × 107, superior to the devices based on the nondoped ZnO TFTs (1.6 cm2 V-1 s-1). Even when annealed at 150 C, the device still showed good transistor operation with an electron mobility of 0.54 cm2 V-1 s-1. The inverted bulk heterojunction solar cells based on P3HT:PCBM blend system fabricated using 10 mol % LiF doped ZnO as electron selective layer showed higher power conversion efficiency (η = 3.3%) than that from undoped ZnO thin films (η = 2.94%) due to enhanced short circuit current (Jsc = 10.55 mA/cm2). Our results suggest that LiF incorporation can be a useful technique to produce high performance and low temperature solution-processed oxide TFTs and interface layer for solar cells. © 2013 American Chemical Society. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1021/am4014488 | |
dc.source | Scopus | |
dc.subject | field effect transistors | |
dc.subject | inverted solar cells | |
dc.subject | LiF | |
dc.subject | low temperature | |
dc.subject | ZnO | |
dc.type | Article | |
dc.contributor.department | CHEMISTRY | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.description.doi | 10.1021/am4014488 | |
dc.description.sourcetitle | ACS Applied Materials and Interfaces | |
dc.description.volume | 5 | |
dc.description.issue | 14 | |
dc.description.page | 6687-6693 | |
dc.identifier.isiut | 000322432500036 | |
Appears in Collections: | Staff Publications |
Show simple item record
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.