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|Title:||Profiling nanowire thermal resistance with a spatial resolution of nanometers||Authors:||Liu, D.
|Keywords:||electron beam heating
nanoscale thermal transport
|Issue Date:||12-Feb-2014||Citation:||Liu, D., Xie, R., Yang, N., Li, B., Thong, J.T.L. (2014-02-12). Profiling nanowire thermal resistance with a spatial resolution of nanometers. Nano Letters 14 (2) : 806-812. ScholarBank@NUS Repository. https://doi.org/10.1021/nl4041516||Abstract:||We report a new technique to profile the thermal resistance along a nanowire with a spatial resolution of better than 20 nm. Using this technique, we mapped the thermal conductivity along a Si0.7Ge 0.3/NiSi0.7Ge0.3 heterostructured nanowire. We also measured the interfacial thermal resistance (ITR) across the Si/NiSi 2 interface embedded in Si/NiSi2 heterostructured nanowires. The ITR does not change even for adjacent interfaces as close as ∼50 atomic layers. © 2014 American Chemical Society.||Source Title:||Nano Letters||URI:||http://scholarbank.nus.edu.sg/handle/10635/82936||ISSN:||15306984||DOI:||10.1021/nl4041516|
|Appears in Collections:||Staff Publications|
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