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|Title:||Method for real-time critical dimensions signature monitoring and control: Sensor, actuator, and experimental results||Authors:||Ngo, Y.S.
|Issue Date:||Jan-2013||Citation:||Ngo, Y.S., Ang, K.T., Tay, A. (2013-01). Method for real-time critical dimensions signature monitoring and control: Sensor, actuator, and experimental results. Review of Scientific Instruments 84 (1) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.4776191||Abstract:||We present in this paper a system and method for real-time monitoring and control of critical dimensions (CD) signature profile in lithography. The proposed system involves the development and integration of a scatterometry system, a programmable multi-zone thermal processing system, and control system software. Based on scatterometry, the intensity and phase of the reflected light from the resist film are measured at a fixed incident angle and across multiple wavelengths. A programmable thermal processing system is then used to adjust the processing temperature during post-exposure baking in lithography to achieve the desired CD signature profile. Experimental results demonstrate the feasibility of the proposed approach. An improvement of CD signature control of 85% is achieved in terms of the mean square error with and without control. © 2013 American Institute of Physics.||Source Title:||Review of Scientific Instruments||URI:||http://scholarbank.nus.edu.sg/handle/10635/82690||ISSN:||00346748||DOI:||10.1063/1.4776191|
|Appears in Collections:||Staff Publications|
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