Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.tsf.2013.08.069
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dc.titleHighly conductive and transparent aluminum-doped zinc oxide thin films deposited on polyethylene terephthalate substrates by pulsed laser deposition
dc.contributor.authorWong, L.M.
dc.contributor.authorChiam, S.Y.
dc.contributor.authorChim, W.K.
dc.contributor.authorPan, J.S.
dc.contributor.authorWang, S.J.
dc.date.accessioned2014-10-07T04:29:40Z
dc.date.available2014-10-07T04:29:40Z
dc.date.issued2013-10-31
dc.identifier.citationWong, L.M., Chiam, S.Y., Chim, W.K., Pan, J.S., Wang, S.J. (2013-10-31). Highly conductive and transparent aluminum-doped zinc oxide thin films deposited on polyethylene terephthalate substrates by pulsed laser deposition. Thin Solid Films 545 : 285-290. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2013.08.069
dc.identifier.issn00406090
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/82461
dc.description.abstractHighly transparent and conductive aluminum-doped zinc oxide thin films were deposited on low-cost flexible polyethylene terephthalate substrates at room temperature using pulsed laser deposition and the effects of oxygen pressure and film thickness on film properties were investigated.It was found that grain sizes play a greater role only at smaller film thicknesses in affecting carrier mobility.Resistivity changes at larger film thickness can be caused by near surface/interface depletion that affected both mobility and carrier concentration.The inherent film transparency did not change and any reduction in the film transmittance is likely related to a thickness dependent attenuation effect.This means that different transparent conducting oxides should each possess an optimum film thickness, whereby optimized zinc oxide is typically about 100 nm.A low resistivity of ∼ 6.6 × 10- 4 Ω cm with a high normalized transparency index of > 0.9 for a 110 ± 10 nm thick room-temperature deposited film was obtained, representing one of the best results obtained to date.© 2013 Elsevier B.V.All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.tsf.2013.08.069
dc.sourceScopus
dc.subjectAluminum zinc oxide
dc.subjectAZO PLD TCO
dc.subjectPolyethylene terephthalate
dc.subjectPulsed laser deposition
dc.subjectThickness dependence
dc.subjectTransparent conducting oxide
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1016/j.tsf.2013.08.069
dc.description.sourcetitleThin Solid Films
dc.description.volume545
dc.description.page285-290
dc.description.codenTHSFA
dc.identifier.isiut000324820800047
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