Please use this identifier to cite or link to this item:
https://doi.org/10.1109/LED.2008.2000669
DC Field | Value | |
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dc.title | Germanium source and drain stressors for ultrathin-body and nanowire field-effect transistors | |
dc.contributor.author | Liow, T.-Y. | |
dc.contributor.author | Tan, K.-M. | |
dc.contributor.author | Lee, R.T.P. | |
dc.contributor.author | Zhu, M. | |
dc.contributor.author | Tan, B.L.-H. | |
dc.contributor.author | Balasubramanian, N. | |
dc.contributor.author | Yeo, Y.-C. | |
dc.date.accessioned | 2014-10-07T04:29:07Z | |
dc.date.available | 2014-10-07T04:29:07Z | |
dc.date.issued | 2008-07 | |
dc.identifier.citation | Liow, T.-Y., Tan, K.-M., Lee, R.T.P., Zhu, M., Tan, B.L.-H., Balasubramanian, N., Yeo, Y.-C. (2008-07). Germanium source and drain stressors for ultrathin-body and nanowire field-effect transistors. IEEE Electron Device Letters 29 (7) : 808-810. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2008.2000669 | |
dc.identifier.issn | 07413106 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/82414 | |
dc.description.abstract | Pure germanium (Ge) source and drain (S/D) stressors are integrated with ultrathin-body (UTB) and nanowire field-effect transistors (FETs). This is the first report of the integration of Ge S/D stressors in FETs. The Ge S/D stressors induce a large compressive stress in the channel, resulting in up to 80% IDsat enhancement in UTB-FETs. Electrical results further show that increased substrate compliance effects allow nanowire FETs to achieve even higher levels (96%) of strain-induced enhancement. © 2008 IEEE. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/LED.2008.2000669 | |
dc.source | Scopus | |
dc.subject | Compliance | |
dc.subject | FinFET | |
dc.subject | Germanium | |
dc.subject | Multiple-gate transistor (MuGFET) | |
dc.subject | Strain | |
dc.subject | Stress | |
dc.type | Article | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.description.doi | 10.1109/LED.2008.2000669 | |
dc.description.sourcetitle | IEEE Electron Device Letters | |
dc.description.volume | 29 | |
dc.description.issue | 7 | |
dc.description.page | 808-810 | |
dc.description.coden | EDLED | |
dc.identifier.isiut | 000257626000048 | |
Appears in Collections: | Staff Publications |
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