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|Title:||Effect of substitutional carbon concentration on Schottky-barrier height of nickel silicide formed on epitaxial silicon-carbon films||Authors:||Lim, P.S.Y.
|Issue Date:||2009||Citation:||Lim, P.S.Y., Lee, R.T.P., Sinha, M., Chi, D.Z., Yeo, Y.-C. (2009). Effect of substitutional carbon concentration on Schottky-barrier height of nickel silicide formed on epitaxial silicon-carbon films. Journal of Applied Physics 106 (4) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3197144||Abstract:||The effective electron Schottky barrier height (φB N) of nickel silicide (NiSi:C) formed on silicon-carbon (Si 1-yCy or Si:C) films with different substitutional carbon concentrations Csub was investigated. φB N was observed to decrease substantially with an increase in Csub. When C sub is increased from 0% to 1.5%, φB N is reduced by 200 meV. The results of this work could be useful for the reduction in contact resistance between nickel silicide and silicon-carbon source and drain in strained n -channel metal-oxide-semiconductor field-effect transistors. © 2009 American Institute of Physics.||Source Title:||Journal of Applied Physics||URI:||http://scholarbank.nus.edu.sg/handle/10635/82212||ISSN:||00218979||DOI:||10.1063/1.3197144|
|Appears in Collections:||Staff Publications|
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