Please use this identifier to cite or link to this item:;2-L
Title: Synthesis and characterization of Ge nanocrystals immersed in amorphous SiOx matrix
Authors: Jie, Y.X. 
Wu, X. 
Huan, C.H.A. 
Wee, A.T.S. 
Guo, Y. 
Zhang, T.J.
Pan, J.S. 
Chai, J.
Chua, S.J. 
Issue Date: 1999
Citation: Jie, Y.X.,Wu, X.,Huan, C.H.A.,Wee, A.T.S.,Guo, Y.,Zhang, T.J.,Pan, J.S.,Chai, J.,Chua, S.J. (1999). Synthesis and characterization of Ge nanocrystals immersed in amorphous SiOx matrix. Surface and Interface Analysis 28 (1) : 195-199. ScholarBank@NUS Repository.;2-L
Abstract: Germanium nanocrystals immersed in amorphous SiOx matrix have been synthesized by r.f. co-sputter deposition of Ge and quartz with post-growth annealing at 600-900 °C. The structures of the Ge nanocrystals and SiOx matrix have been studied with x-ray diffraction, high-resolution transmission electron microscopy and XPS depth profiling. Broad-band photoluminescence spectra have been observed from samples annealed at temperatures higher than 600 °C. Possible photoluminescence mechanisms have also been discussed.
Source Title: Surface and Interface Analysis
ISSN: 01422421
DOI: 10.1002/(SICI)1096-9918(199908)28:13.0.CO;2-L
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