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|Title:||Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition||Authors:||Ren, Z.M.
|Issue Date:||15-Aug-1999||Citation:||Ren, Z.M.,Lu, Y.F.,Ho, D.H.K.,Chong, T.C.,Cheong, B.A.,Pang, S.I.,Wang, J.P.,Li, K. (1999-08-15). Raman spectroscopy studies of the influence of substrate temperature and ion beam energy on CNx thin films deposited by nitrogen-ion-assisted pulsed laser deposition. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 38 (8 B) : 4859-4862. ScholarBank@NUS Repository.||Abstract:||Carbon nitride thin films were deposited by nitrogen-ion-assisted pulsed laser ablation of graphite. A KrF excimer laser with pulse duration of 23 ns and wavelength of 248 nm was used as the laser source for the ablation. Raman spectroscopy measurements were used to characterise the deposited thin films. The influences of substrate temperature and nitrogen ion beam energy on the electronic properties of the deposited thin films were studied. The suitable parameters of substrate temperature and ion energy were suggested given our deposition conditions and setup in order to obtain large graphite-like crystallite structures or to realize a high content of amorphous CNx. X-ray photoelectron spectroscopy (XPS) was also adopted to assist the characterisation and evaluation of the deposited CNx thin films. © 1999 Publication Board, Japanese Journal of Applied Physics.||Source Title:||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers||URI:||http://scholarbank.nus.edu.sg/handle/10635/81049||ISSN:||00214922|
|Appears in Collections:||Staff Publications|
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