Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/80665
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dc.titleLaser-induced nano-oxidation on hydrogen-passivated Ge (100) surfaces under a scanning tunneling microscope tip
dc.contributor.authorLu, Y.F.
dc.contributor.authorMai, Z.H.
dc.contributor.authorQiu, G.
dc.contributor.authorChim, W.K.
dc.date.accessioned2014-10-07T03:00:00Z
dc.date.available2014-10-07T03:00:00Z
dc.date.issued1999-10-18
dc.identifier.citationLu, Y.F.,Mai, Z.H.,Qiu, G.,Chim, W.K. (1999-10-18). Laser-induced nano-oxidation on hydrogen-passivated Ge (100) surfaces under a scanning tunneling microscope tip. Applied Physics Letters 75 (16) : 2359-2361. ScholarBank@NUS Repository.
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/80665
dc.description.abstractLaser-induced nano-oxidation on hydrogen-passivated Ge (100) surfaces under a scanning tunneling microscope tip in air has been investigated. A 532 nm Nd:YAG pulsed laser with a pulse duration of 7 ns was used. A 2 × 2 oxide dot array with dot sizes between 20 and 30 nm and an oxide single line with a width less than 30 nm have been created using an electrochemical-etched tungsten tip under laser irradiation. The modified regions were characterized by atomic force microscope. The apparent depth of oxide layer as a function of laser intensity has been studied. The advantages and drawbacks of using a continuous wave laser and a pulsed laser will be discussed. © 1999 American Institute of Physics.
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL ENGINEERING
dc.description.sourcetitleApplied Physics Letters
dc.description.volume75
dc.description.issue16
dc.description.page2359-2361
dc.description.codenAPPLA
dc.identifier.isiutNOT_IN_WOS
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