Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.112385
DC FieldValue
dc.titleCharging dynamics of integrated circuit passivation layer probe holes in the electron beam tester
dc.contributor.authorPhang, J.C.H.
dc.contributor.authorSim, K.S.
dc.contributor.authorChan, D.S.H.
dc.date.accessioned2014-10-07T02:56:17Z
dc.date.available2014-10-07T02:56:17Z
dc.date.issued1994
dc.identifier.citationPhang, J.C.H., Sim, K.S., Chan, D.S.H. (1994). Charging dynamics of integrated circuit passivation layer probe holes in the electron beam tester. Applied Physics Letters 65 (26) : 3341-3343. ScholarBank@NUS Repository. https://doi.org/10.1063/1.112385
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/80325
dc.description.abstractNumerical simulations show that the sidewall of a probe hole in the SiO2 passivation layer of an integrated circuit charges negatively when a 1 keV beam is probing a test point inside the probe hole. The negative charges on the sidewalls create a local electric field that suppresses the low-energy secondary electrons and at the same time focuses the higher-energy secondary electrons. These potential barrier and lens effects degrade the detected secondary electron signal and may have significant consequences for voltage contrast measurements. © 1994 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.112385
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL ENGINEERING
dc.description.doi10.1063/1.112385
dc.description.sourcetitleApplied Physics Letters
dc.description.volume65
dc.description.issue26
dc.description.page3341-3343
dc.identifier.isiutA1994PY28000013
Appears in Collections:Staff Publications

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