Please use this identifier to cite or link to this item: https://doi.org/10.1002/adma.201000436
Title: Making patterns on graphene
Authors: Zhou, Y.
Loh, K.P. 
Issue Date: 24-Aug-2010
Citation: Zhou, Y., Loh, K.P. (2010-08-24). Making patterns on graphene. Advanced Materials 22 (32) : 3615-3620. ScholarBank@NUS Repository. https://doi.org/10.1002/adma.201000436
Abstract: Craphene-based nanostructures are considered as promising alternatives to silicon-based mesostructures in future electronic nanodevices. The lithographical patterning of graphene, which are essential steps in any form of microelectronic processing, present interesting challenges because of the atomic layer thickness of graphene. Mesoscopic devices based on graphene require high spatial resolution patterning that will induce as little damage as possible. This research news highlights and evaluates recent developments in the nanostructuring and patterning of graphene. © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Source Title: Advanced Materials
URI: http://scholarbank.nus.edu.sg/handle/10635/76464
ISSN: 09359648
DOI: 10.1002/adma.201000436
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