Please use this identifier to cite or link to this item: https://doi.org/10.1039/c3ra23473h
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dc.titleEffects of contact treatments on solution-processed n-type dicyano-ovalenediimide and its complementary circuits
dc.contributor.authorChang, J.
dc.contributor.authorLi, J.
dc.contributor.authorChang, K.L.
dc.contributor.authorZhang, J.
dc.contributor.authorWu, J.
dc.date.accessioned2014-06-23T05:37:42Z
dc.date.available2014-06-23T05:37:42Z
dc.date.issued2013-06-21
dc.identifier.citationChang, J., Li, J., Chang, K.L., Zhang, J., Wu, J. (2013-06-21). Effects of contact treatments on solution-processed n-type dicyano-ovalenediimide and its complementary circuits. RSC Advances 3 (23) : 8721-8727. ScholarBank@NUS Repository. https://doi.org/10.1039/c3ra23473h
dc.identifier.issn20462069
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/76031
dc.description.abstractThe device performance of bottom-contact organic field-effect transistors (OFETs) was limited by contact resistance which originates from a non-optimal semiconductor growth morphology and limited charge injection area. Self-assembled monolayer (SAM) treatment has proved to be an effective approach to optimize thin film growth and align the energy levels. This SAM-induced work-function modification has different effects on the charge injection barrier as well as on the device performance in terms of threshold voltage. These results were analysed in detail from the perspectives of surface morphology and energy alignment at the Au-semiconductor interface in n-type ovalenediimide (ODI-CN)-based OFETs. Finally, complementary inverters were built using pentacene (p-type) and ODI-CN (n-type) OFETs, and these showed a voltage gain of 13. © The Royal Society of Chemistry 2013.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1039/c3ra23473h
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentCHEMISTRY
dc.description.doi10.1039/c3ra23473h
dc.description.sourcetitleRSC Advances
dc.description.volume3
dc.description.issue23
dc.description.page8721-8727
dc.description.codenRSCAC
dc.identifier.isiut000319130600019
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