Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.susc.2003.08.039
DC FieldValue
dc.titleAdsorption and thermal dissociation of pyrrole on Si(1 0 0)-2 × 1
dc.contributor.authorQiao, M.-H.
dc.contributor.authorTao, F.
dc.contributor.authorCao, Y.
dc.contributor.authorXu, G.-Q.
dc.date.accessioned2014-06-23T05:31:30Z
dc.date.available2014-06-23T05:31:30Z
dc.date.issued2003-10-20
dc.identifier.citationQiao, M.-H., Tao, F., Cao, Y., Xu, G.-Q. (2003-10-20). Adsorption and thermal dissociation of pyrrole on Si(1 0 0)-2 × 1. Surface Science 544 (2-3) : 285-294. ScholarBank@NUS Repository. https://doi.org/10.1016/j.susc.2003.08.039
dc.identifier.issn00396028
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/75531
dc.description.abstractThe adsorption and thermal reaction of pyrrole on Si(100)-2×1 have been studied using X-ray and ultra-violet photoelectron spectroscopies (XPS and UPS) and high resolution electron energy loss spectroscopy (HREELS). At low exposures, Pyrrole chemisorbs molecularly at 120 K with its ring parallel to the surface via the π-interaction. The increase in coverage causes tilting of chemisorbed molecules towards the surface normal, attributable to the adsorbate-adsorbate interactions. At ∼350 K, the N-H bond scission of the π-bonded species occurs, resulting in Si-H and vertically N-bonded pyrrolyl on the surface. The pyrrolyl species is thermally stable to 700 K. Compared to furan or thiophene on Si(100), this higher thermal stability is ascribed to the passivation effect of the H-atoms from N-H bond dissociation and the less strain within the pyrrolyl-substrate complex. Further annealing to 900 K results in the formation of silicon carbide and silicon nitride on the substrate. © 2003 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.susc.2003.08.039
dc.sourceScopus
dc.subjectAromatics
dc.subjectChemisorption
dc.subjectElectron energy loss spectroscopy (EELS)
dc.subjectSilicon
dc.subjectSurface chemical reaction
dc.subjectVisible and ultraviolet photoelectron spectroscopy
dc.subjectX-ray photoelectron spectroscopy
dc.typeArticle
dc.contributor.departmentCHEMISTRY
dc.description.doi10.1016/j.susc.2003.08.039
dc.description.sourcetitleSurface Science
dc.description.volume544
dc.description.issue2-3
dc.description.page285-294
dc.description.codenSUSCA
dc.identifier.isiut000186017900022
Appears in Collections:Staff Publications

Show simple item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

28
checked on Nov 16, 2019

WEB OF SCIENCETM
Citations

23
checked on Nov 8, 2019

Page view(s)

36
checked on Oct 27, 2019

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.