Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.404894
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dc.titleOptimisation methodology for low-g microaccelerometer
dc.contributor.authorTay, F.E.H.
dc.contributor.authorJun, X.
dc.contributor.authorLogeeswaran, V.J.
dc.date.accessioned2014-06-19T09:10:26Z
dc.date.available2014-06-19T09:10:26Z
dc.date.issued2000
dc.identifier.citationTay, F.E.H., Jun, X., Logeeswaran, V.J. (2000). Optimisation methodology for low-g microaccelerometer. Proceedings of SPIE - The International Society for Optical Engineering 4230 : 128-139. ScholarBank@NUS Repository. https://doi.org/10.1117/12.404894
dc.identifier.issn0277786X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/75059
dc.description.abstractThis paper presents a single crystal silicon low-g open loop microaccelerometer designed and fabricated through a spreadsheet optimisation methodology. The paper begins with the theoretical formulation and analysis of the differential capacitive accelerometer with full-scale measurement range of ±2g and mg resolution. The "House of Quality" was then used to model and analyse the sensor design variables and device specifications qualitatively. The optimisation was implemented using the Excel Solver™ and MATLAB. The effects of electrostatic spring constant on the natural frequency and sensitivity of the accelerometer have been thoroughly discussed. The ratiometric error for this system has been optimised and is well below 2% with a cross axis sensitivity of less than 3%. The operating voltage is 5V DC. The construction is based on a hybrid two-chip design and the sensing element is wire bonded to a CMOS ASIC.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1117/12.404894
dc.sourceScopus
dc.subjectElectrostatic spring constant
dc.subjectMicroaccelerometer
dc.subjectModelling
dc.subjectRatiometricity
dc.subjectSpreadsheet optimisation
dc.typeConference Paper
dc.contributor.departmentMECHANICAL & PRODUCTION ENGINEERING
dc.description.doi10.1117/12.404894
dc.description.sourcetitleProceedings of SPIE - The International Society for Optical Engineering
dc.description.volume4230
dc.description.page128-139
dc.description.codenPSISD
dc.identifier.isiut000168019300016
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