Please use this identifier to cite or link to this item:
|Title:||A new fabrication process of silicon nanotips - NERCOM||Authors:||Tay, F.E.H.
|Keywords:||Notching effect of reflected charges on the mask (NERCOM)
|Issue Date:||2006||Citation:||Tay, F.E.H., Iliescu, C., Xu, G., Chen, B., Avram, M. (2006). A new fabrication process of silicon nanotips - NERCOM. Progress in Biomedical Optics and Imaging - Proceedings of SPIE 6036 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.638516||Abstract:||This paper presents a new fabrication process for nanotips array using notching effect of reflected charges on mask (NERCOM). The NERCOM fabrication process is based on two phenomena: flowing of thick photoresist mask after 'bake and the notching effect of the reflected charges from the photoresist mask in a plasma etching process. Heating the photoresist at different temperature and time will generate different profile of the masking layer walls. During the plasma etching process, the charges (ions and radicals) are reflected by the oblique profile of the masking layer walls and generate an undercut. This phenomenon is utilized with an isotropic etching process in a Deep RIE system to produce tips. Due to the isotropy of the process, the tips are generated. The results indicate that the radii of the tips are in the range of 40 to 60 nm.||Source Title:||Progress in Biomedical Optics and Imaging - Proceedings of SPIE||URI:||http://scholarbank.nus.edu.sg/handle/10635/73060||ISSN:||16057422||DOI:||10.1117/12.638516|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on May 12, 2019
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.