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| Title: | Process variation during tunnel window formation and its impact on the reliability performance of FLOTOX EEPROM devices | Authors: | Lai, K.-K. Lim, P.-S. Chim, W.-K. Pan, Y. |
Issue Date: | 2000 | Citation: | Lai, K.-K.,Lim, P.-S.,Chim, W.-K.,Pan, Y. (2000). Process variation during tunnel window formation and its impact on the reliability performance of FLOTOX EEPROM devices. IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE : 196-199. ScholarBank@NUS Repository. | Abstract: | Process variation in the buffered oxide etch (BOE) duration during tunnel window formation can cause floating-gate tunnel-oxide (FLOTOX) electrically erasable and programmable read-only memory (EEPROM) devices to exhibit enhanced window closure effect during write/erase endurance test. Electrical and physical characterisation of devices with insufficient BOE duration indicated the presence of a poor quality or "crabby" oxide region (exhibiting enhanced electron trapping) remaining after tunnel window formation before tunnel oxide growth. © 2000 IEEE. | Source Title: | IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE | URI: | http://scholarbank.nus.edu.sg/handle/10635/72871 | ISBN: | 0780364309 |
| Appears in Collections: | Staff Publications |
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