Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.456835
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dc.titleThe optical and surface properties of ZnO thin films by PLD
dc.contributor.authorLu, Y.F.
dc.contributor.authorNi, H.Q.
dc.contributor.authorRen, Z.M.
dc.date.accessioned2014-06-19T03:30:08Z
dc.date.available2014-06-19T03:30:08Z
dc.date.issued2002
dc.identifier.citationLu, Y.F., Ni, H.Q., Ren, Z.M. (2002). The optical and surface properties of ZnO thin films by PLD. Proceedings of SPIE - The International Society for Optical Engineering 4426 : 217-220. ScholarBank@NUS Repository. https://doi.org/10.1117/12.456835
dc.identifier.issn0277786X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/71987
dc.description.abstractZnO films have been grown on silicon (100) and sapphire (0001) substrates by pulsed laser deposition (PLD). The influences of substrate temperature and laser fluence on the properties of the films were studied. The effects of annealing on the ZnO films were investigated by X-ray photoelectron spectroscopy (XPS). The surface properties of ZnO were studied by scanning tunneling spectroscopy (STS). The band edge emission properties of the ZnO films have been studied by the photoluminescence spectroscopy (PL).
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1117/12.456835
dc.sourceScopus
dc.subjectAnnealing
dc.subjectPLD
dc.subjectSTS
dc.subjectXPS
dc.subjectZnO
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1117/12.456835
dc.description.sourcetitleProceedings of SPIE - The International Society for Optical Engineering
dc.description.volume4426
dc.description.page217-220
dc.description.codenPSISD
dc.identifier.isiut000176422100047
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