Please use this identifier to cite or link to this item: https://doi.org/10.1109/ASMC.2006.1638724
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dc.titleRobust real-time thin film thickness estimation
dc.contributor.authorKiew, C.M.
dc.contributor.authorTay, A.
dc.contributor.authorHo, W.K.
dc.contributor.authorLim, K.W.
dc.contributor.authorLee, J.H.
dc.date.accessioned2014-06-19T03:26:37Z
dc.date.available2014-06-19T03:26:37Z
dc.date.issued2006
dc.identifier.citationKiew, C.M.,Tay, A.,Ho, W.K.,Lim, K.W.,Lee, J.H. (2006). Robust real-time thin film thickness estimation. ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings 2006 : 57-62. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ASMC.2006.1638724" target="_blank">https://doi.org/10.1109/ASMC.2006.1638724</a>
dc.identifier.isbn1424402549
dc.identifier.issn10788743
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/71688
dc.description.abstractThe dissolution of photoresist in developer solution often leads to changes in the chemical composite of the solution which hinder film thickness estimation. This paper addresses this issue by proposing a modified Fringe Order Computation (MFOC) method which analyses reflected light intensity data acquired using commercially available optical spectrometry system. MFOC uses simple arithmetic operations and is capable of computing film thickness at real-time. It is more reliable as compared to other methods during develop step in microlithography process. © 2006 IEEE.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/ASMC.2006.1638724
dc.sourceScopus
dc.subjectFilm thickness estimation
dc.subjectMicrolithography
dc.subjectOptical spectrometry
dc.subjectPhotoresist development
dc.subjectSemiconductor manufacturing
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1109/ASMC.2006.1638724
dc.description.sourcetitleASMC (Advanced Semiconductor Manufacturing Conference) Proceedings
dc.description.volume2006
dc.description.page57-62
dc.identifier.isiutNOT_IN_WOS
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