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|Title:||Parallel nanostructuring of GeSbTe film with particle mask||Authors:||Wang, Z.B.
|Issue Date:||Sep-2004||Citation:||Wang, Z.B.,Hong, M.H.,Lukyanchuk, B.S.,Huang, S.M.,Wang, Q.F.,Shi, L.P.,Chong, T.C. (2004-09). Parallel nanostructuring of GeSbTe film with particle mask. Applied Physics A: Materials Science and Processing 79 (4-6) : 1603-1606. ScholarBank@NUS Repository.||Abstract:||Parallel nanostructuring of a GeSbTe film may significantly improve the recording performance in data storage. In this paper, a method that permits direct and massively parallel nanopatterning of the substrate surface by laser irradiation is investigated. Polystyrene spherical particles were deposited on the surface in a monolayer array by self-assembly, The array was then irradiated with a 248-nm KrF laser. A sub-micron nanodent array can be obtained after single-pulse irradiation. These nanodents change their shapes at different laser energies. The optical near-field distribution around the particles was calculated according to the exact solution of the light-scattering problem. The influence of the presence of the substrate on the optical near field was also studied. The mechanisms for the generation of the nanodent structures are discussed.||Source Title:||Applied Physics A: Materials Science and Processing||URI:||http://scholarbank.nus.edu.sg/handle/10635/71358||ISSN:||09478396|
|Appears in Collections:||Staff Publications|
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