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dc.titleMicrowave coplanar filters on Si substrates
dc.contributor.authorChan, K.T.
dc.contributor.authorChin, A.
dc.contributor.authorKuo, J.T.
dc.contributor.authorChang, C.Y.
dc.contributor.authorDuh, D.S.
dc.contributor.authorLin, W.J.
dc.contributor.authorZhu, C.
dc.contributor.authorLi, M.F.
dc.contributor.authorKwong, D.-L.
dc.identifier.citationChan, K.T.,Chin, A.,Kuo, J.T.,Chang, C.Y.,Duh, D.S.,Lin, W.J.,Zhu, C.,Li, M.F.,Kwong, D.-L. (2003). Microwave coplanar filters on Si substrates. IEEE MTT-S International Microwave Symposium Digest 3 : 1909-1912. ScholarBank@NUS Repository.
dc.description.abstractThe excellent RF performance for band-pass and band-stop microwave coplanar filters at 22∼94 GHz on silicon substrates was achieved using an optimized proton implantation process. The implantation process was optimized for better compatibility with VLSI process. The equivalent circuit model was further used to analyze the substrate loss effects of the band pass filter.
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.sourcetitleIEEE MTT-S International Microwave Symposium Digest
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