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|Title:||Fabrication of magnetic nanostructures using KrF lithography||Authors:||Singh, N.
Phase shift mask
|Issue Date:||2004||Citation:||Singh, N.,Goolaup, S.,Adeyeye, A.O. (2004). Fabrication of magnetic nanostructures using KrF lithography. 2004 4th IEEE Conference on Nanotechnology : 65-67. ScholarBank@NUS Repository.||Abstract:||We have developed a large area nanofabrication technique for synthesizing nanomagnetic arrays based on KrF lithographic exposure tool. Using phase shift mask technique and resist trimming, we have fabricated array of complex nanomagnetic structures with dimensions well below the resolution limit of conventional optical lithography. Magnetic nanostructures of different shapes, complexities and sizes down to 50nm displaying novel properties have been fabricated using lift off method. © 2004 IEEE.||Source Title:||2004 4th IEEE Conference on Nanotechnology||URI:||http://scholarbank.nus.edu.sg/handle/10635/70279||ISBN:||0780385365|
|Appears in Collections:||Staff Publications|
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