Please use this identifier to cite or link to this item:
https://doi.org/10.1109/DAC.2008.4555872
Title: | Design-process integration for performance-based OPC framework | Authors: | Teh, S.-H. Heng, C.-H. Tay, A. |
Keywords: | Circuit performance Design-process integration Lithography Mask design OPC |
Issue Date: | 2008 | Citation: | Teh, S.-H.,Heng, C.-H.,Tay, A. (2008). Design-process integration for performance-based OPC framework. Proceedings - Design Automation Conference : 522-527. ScholarBank@NUS Repository. https://doi.org/10.1109/DAC.2008.4555872 | Abstract: | Along the continued shrinking of critical dimension (CD), the optical proximity correction (OPC) scheme inevitably becomes more aggressive and results in greater mask complexity and cost. Conventional OPC are edge-placement-error (EPE) driven without considering the effect of correction on circuit performance at all. We propose a performance-based OPC (PB-OPC) framework that employs a much simpler mask correction algorithm based on the real-time estimated device performances. When compared to the conventional OPC approach, our PB-OPC achieved 33 to 93% reduction in mask MEBES size and closer circuit performance matching to the design intent. © 2008 ACM. | Source Title: | Proceedings - Design Automation Conference | URI: | http://scholarbank.nus.edu.sg/handle/10635/69885 | ISBN: | 9781605581156 | ISSN: | 0738100X | DOI: | 10.1109/DAC.2008.4555872 |
Appears in Collections: | Staff Publications |
Show full item record
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.