Please use this identifier to cite or link to this item: https://doi.org/10.1007/BF00246947
DC FieldValue
dc.titleEffect of gas evolution on dispersion in an electrochemical reactor
dc.contributor.authorWu, W.S.
dc.contributor.authorRangaiah, G.P.
dc.contributor.authorFleischmann, M.
dc.date.accessioned2014-06-17T10:01:04Z
dc.date.available2014-06-17T10:01:04Z
dc.date.issued1993-02
dc.identifier.citationWu, W.S.,Rangaiah, G.P.,Fleischmann, M. (1993-02). Effect of gas evolution on dispersion in an electrochemical reactor. Journal of Applied Electrochemistry 23 (2) : 113-119. ScholarBank@NUS Repository. <a href="https://doi.org/10.1007/BF00246947" target="_blank">https://doi.org/10.1007/BF00246947</a>
dc.identifier.issn0021891X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/67411
dc.description.abstractGas evolution at electrodes is encountered in many electrochemical processes, and the resulting gas bubbles affect mixing or dispersion in the neighbouring liquid. Experiments were conducted to study the effect of electrogenerated gas bubbles on dispersion in the fluid close to wall in a parallel-plate electrochemical reactor. Platinum microelectrodes and copper electrodes were used to generate gas (hydrogen or oxygen depending on polarity) bubbles and to measure dispersion, respectively. Estimated void fraction of gas bubbles was less than 0.01. Response curves were modelled using the axially dispersed plug flow model. Results obtained indicate that mean residence time of marked material (i.e. fluid close to wall) is almost unaffected by gas bubbles. Dispersion coefficient, however, increases with gas evolution at low liquid flow rates (say, for Reynolds number less than 100); but it is unaffected at higher flow rates. The effect of hydrogen and oxygen bubbles on dispersion under the range of conditions studied, appears to be similar. © 1993 Chapman &amp; Hall.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1007/BF00246947
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentCHEMICAL ENGINEERING
dc.description.doi10.1007/BF00246947
dc.description.sourcetitleJournal of Applied Electrochemistry
dc.description.volume23
dc.description.issue2
dc.description.page113-119
dc.description.codenJAELB
dc.identifier.isiutNOT_IN_WOS
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