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|Title:||Double-layer inorganic antireflective system for KrF lithography||Authors:||Xu, M.
|Issue Date:||Jan-2000||Citation:||Xu, M., Ko, T.-M. (2000-01). Double-layer inorganic antireflective system for KrF lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 18 (1) : 127-135. ScholarBank@NUS Repository. https://doi.org/10.1116/1.591163||Abstract:||A novel double-layer bottom antireflective method was developed. It contained the advantages of both interference and photoabsorptive types of bottom antireflective coating (BARC) This method could achieve extremely low reflectivity.||Source Title:||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures||URI:||http://scholarbank.nus.edu.sg/handle/10635/66532||ISSN:||10711023||DOI:||10.1116/1.591163|
|Appears in Collections:||Staff Publications|
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