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https://scholarbank.nus.edu.sg/handle/10635/62459
DC Field | Value | |
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dc.title | Negative bias temperature instability on plasma-nitrided silicon dioxide film | |
dc.contributor.author | Ang, C.-H. | |
dc.contributor.author | Lek, C.-M. | |
dc.contributor.author | Tan, S.-S. | |
dc.contributor.author | Cho, B.-J. | |
dc.contributor.author | Chen, T. | |
dc.contributor.author | Lin, W. | |
dc.contributor.author | Zhen, J.-G. | |
dc.date.accessioned | 2014-06-17T06:51:16Z | |
dc.date.available | 2014-06-17T06:51:16Z | |
dc.date.issued | 2002-03-15 | |
dc.identifier.citation | Ang, C.-H.,Lek, C.-M.,Tan, S.-S.,Cho, B.-J.,Chen, T.,Lin, W.,Zhen, J.-G. (2002-03-15). Negative bias temperature instability on plasma-nitrided silicon dioxide film. Japanese Journal of Applied Physics, Part 2: Letters 41 (3 B) : L314-L316. ScholarBank@NUS Repository. | |
dc.identifier.issn | 00214922 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/62459 | |
dc.description.abstract | The behavior of negative-bias-temperature-instability (NBTI) on ultra-thin plasma-nitrided silicon dioxide films (1.8 and 2.6 nm) has been investigated and compared with conventional thermal nitridation. Plasma-nitrided oxides shows more resistance to NBTI, as compared to thermal-nitrided oxides. This is attributed to the fact that plasma nitridation incorporates the nitrogen at the top oxide surface, thus mitigating the undesirable nitrogen-enhanced NBTI effect. Additionally, the degradation mechanism of NBTI is found to be insensitive to the nitridation process, nitrogen concentration and boron penetration. | |
dc.source | Scopus | |
dc.subject | Interface trap | |
dc.subject | MOS | |
dc.subject | Negative-bias-temperature-instability | |
dc.subject | Thin oxide | |
dc.type | Article | |
dc.contributor.department | ELECTRICAL ENGINEERING | |
dc.description.sourcetitle | Japanese Journal of Applied Physics, Part 2: Letters | |
dc.description.volume | 41 | |
dc.description.issue | 3 B | |
dc.description.page | L314-L316 | |
dc.description.coden | JAPLD | |
dc.identifier.isiut | NOT_IN_WOS | |
Appears in Collections: | Staff Publications |
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