Please use this identifier to cite or link to this item: https://doi.org/10.1007/s00170-005-0245-0
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dc.titleThe upper bound of tool edge radius for nanoscale ductile mode cutting of silicon wafer
dc.contributor.authorArefin, S.
dc.contributor.authorLi, X.P.
dc.contributor.authorRahman, M.
dc.contributor.authorLiu, K.
dc.date.accessioned2014-06-17T06:36:17Z
dc.date.available2014-06-17T06:36:17Z
dc.date.issued2007-01
dc.identifier.citationArefin, S., Li, X.P., Rahman, M., Liu, K. (2007-01). The upper bound of tool edge radius for nanoscale ductile mode cutting of silicon wafer. International Journal of Advanced Manufacturing Technology 31 (7-8) : 655-662. ScholarBank@NUS Repository. https://doi.org/10.1007/s00170-005-0245-0
dc.identifier.issn02683768
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/61533
dc.description.abstractFor ductile mode cutting of brittle materials, such as silicon wafers, the undeformed chip thickness has to be smaller than the tool edge radius. In practical application, for high production rate, the undeformed chip thickness is expected to be as large as possible. Therefore, the tool edge radius is expected to be as large as possible. In this study, the upper bound of the tool edge radius is investigated through cutting experiments. © Springer-Verlag London Limited 2007.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1007/s00170-005-0245-0
dc.sourceScopus
dc.subjectCutting edge radius
dc.subjectDuctile mode cutting
dc.subjectNanoscale
dc.subjectSilicon wafer
dc.typeArticle
dc.contributor.departmentMECHANICAL ENGINEERING
dc.description.doi10.1007/s00170-005-0245-0
dc.description.sourcetitleInternational Journal of Advanced Manufacturing Technology
dc.description.volume31
dc.description.issue7-8
dc.description.page655-662
dc.description.codenIJATE
dc.identifier.isiut000243053000004
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