Please use this identifier to cite or link to this item: https://doi.org/10.1088/0022-3727/41/5/055307
Title: Effects of interfacial energy modifications on the tribology of UHMWPE coated Si
Authors: Minn, M. 
Jonathan, L.Y. 
Sinha, S.K. 
Issue Date: 7-Mar-2008
Citation: Minn, M., Jonathan, L.Y., Sinha, S.K. (2008-03-07). Effects of interfacial energy modifications on the tribology of UHMWPE coated Si. Journal of Physics D: Applied Physics 41 (5) : -. ScholarBank@NUS Repository. https://doi.org/10.1088/0022-3727/41/5/055307
Abstract: This paper presents results on the tribological properties of ultra-high molecular weight polyethylene (UHMWPE) films on Si substrates modified by interfacial layers of different surface energies (hydrophobicity). Five different interfaces, namely bare Si (i.e. no interfacial modification), heated Si, Si/3-aminopropyltrimethoxysilane (Si/APTMS), hydrogenated Si (Si-H) and Si/octadecyltrichlorosilane (Si/OTS) were prepared on a Si substrate by physical and chemical methods that gave water contact angles of the interfaces as 21°, 46°, 52°, 71° and 104°, respectively. UHMWPE (6 νm thickness) was coated onto surface energy modified Si substrates by the dip-coating method. The tribological tests were conducted using a ball-on-disc tribometer with a 4 mm diameter silicon nitride ball as the slider. Bare Si, which was the most hydrophilic of all, and Si/OTS, the most hydrophobic interface, showed much lower wear resistance when compared with heated Si, Si/APTMS and Si-H interfaces, with Si-H interface giving the best result. The results of a scratch test for adhesion strength between the interface and UHMWPE were consistent with the tribological properties of the films. It is concluded that the wear performance of ultra-thin UHMWPE films on Si substrates could be extended by several orders of magnitude by suitably modifying the interfaces (different surface energies) of the silicon substrates. The coefficient of friction also follows a similar trend with Si-H interface giving the lowest value among all samples. © 2008 IOP Publishing Ltd.
Source Title: Journal of Physics D: Applied Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/60111
ISSN: 00223727
DOI: 10.1088/0022-3727/41/5/055307
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.