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|Title:||Surface nanostructuring by femtosecond laser irradiation through near-field scanning optical microscopy||Authors:||Lin, Y.
Near-field scanning optical microscopy
|Issue Date:||12-Feb-2007||Citation:||Lin, Y., Hong, M.H., Wang, W.J., Wang, Z.B., Chen, G.X., Xie, Q., Tan, L.S., Chong, T.C. (2007-02-12). Surface nanostructuring by femtosecond laser irradiation through near-field scanning optical microscopy. Sensors and Actuators, A: Physical 133 (2 SPEC. ISS.) : 311-316. ScholarBank@NUS Repository. https://doi.org/10.1016/j.sna.2006.05.047||Abstract:||A near-field scanning optical microscopy (NSOM) and a double-frequency femtosecond laser (400 nm, 100 fs) were applied to push the optical resolution further down to sub-50 nm on thin UV photoresist. A 20-nm feature size can be obtained. It is at a resolution of λ/20 (λ: laser wavelength) and a/2 (a: NSOM probe aperture diameter), respectively. It is proved that laser power and exposure time can affect feature size of lithography patterns. In this paper, the effect of probe-to-sample distance on dot-pattern features is studied, and different dot-pattern shapes are generated: dumbbell-dot, ellipsoid-dot and circle-dot. The simulated light field spatial distributions across the nano-aperture based on Bethe-Bouwkamp model is found to agree with experimental results very well. © 2006 Elsevier B.V. All rights reserved.||Source Title:||Sensors and Actuators, A: Physical||URI:||http://scholarbank.nus.edu.sg/handle/10635/57562||ISSN:||09244247||DOI:||10.1016/j.sna.2006.05.047|
|Appears in Collections:||Staff Publications|
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