Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.optcom.2008.09.081
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dc.titleSpot focus size effect in spectroscopic ellipsometry of thin films
dc.contributor.authorNg, T.W.
dc.contributor.authorTay, A.
dc.contributor.authorWang, Y.
dc.date.accessioned2014-06-17T03:06:51Z
dc.date.available2014-06-17T03:06:51Z
dc.date.issued2009-01-15
dc.identifier.citationNg, T.W., Tay, A., Wang, Y. (2009-01-15). Spot focus size effect in spectroscopic ellipsometry of thin films. Optics Communications 282 (2) : 172-176. ScholarBank@NUS Repository. https://doi.org/10.1016/j.optcom.2008.09.081
dc.identifier.issn00304018
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/57497
dc.description.abstractA focused as opposed to collimated light beam is typically used as probe in order to achieve a smaller as well as more intense light interrogation area in spectroscopic ellipsometry of thin films. In this work, we performed geometric ray analysis at the illumination and recording ends of such a system. The numerical results revealed substantial changes in (i) average optical path length and (ii) optical path length differences, which varied according to wavelength despite the film thickness remaining uniform. These results were able to consistently explain the anomalies found when different focus probe beam sizes were used in experimental spectroscopic ellipsometry measurements. © 2008 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.optcom.2008.09.081
dc.sourceScopus
dc.subjectEllipsometry
dc.subjectGeometrical optics
dc.subjectWafer film
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1016/j.optcom.2008.09.081
dc.description.sourcetitleOptics Communications
dc.description.volume282
dc.description.issue2
dc.description.page172-176
dc.description.codenOPCOB
dc.identifier.isiut000261852400005
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