Please use this identifier to cite or link to this item: https://doi.org/10.1021/ie900219u
DC FieldValue
dc.titlePredictive ratio control for interacting processes
dc.contributor.authorTan, K.K.
dc.contributor.authorTay, A.
dc.contributor.authorShao, Z.
dc.contributor.authorHuang, S.
dc.contributor.authorLee, T.H.
dc.date.accessioned2014-06-17T03:02:25Z
dc.date.available2014-06-17T03:02:25Z
dc.date.issued2009
dc.identifier.citationTan, K.K., Tay, A., Shao, Z., Huang, S., Lee, T.H. (2009). Predictive ratio control for interacting processes. Industrial and Engineering Chemistry Research 48 (23) : 10515-10521. ScholarBank@NUS Repository. https://doi.org/10.1021/ie900219u
dc.identifier.issn08885885
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/57114
dc.description.abstractIn this paper, a predictive-PID ratio control scheme is developed for multivariable processes. The Generalized predictive control based PID configuration is incorporated into various conventional ratio control schemes. Conventional parallel and series ratio control cannot satisfy the stringent requirements. The proposed method is applied to the wafer temperature uniformity control in the lithography. Both simulation and experimental results show the effectiveness of the proposed predictive ratio control method. © 2009 American Chemical Society.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1021/ie900219u
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1021/ie900219u
dc.description.sourcetitleIndustrial and Engineering Chemistry Research
dc.description.volume48
dc.description.issue23
dc.description.page10515-10521
dc.description.codenIECRE
dc.identifier.isiut000272039200046
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