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Please use this identifier to cite or link to this item: https://doi.org/10.1002/smll.201201889
DC FieldValue
dc.titleLarge area resist-free soft lithographic patterning of graphene
dc.contributor.authorGeorge, A.
dc.contributor.authorMathew, S.
dc.contributor.authorVan Gastel, R.
dc.contributor.authorNijland, M.
dc.contributor.authorGopinadhan, K.
dc.contributor.authorBrinks, P.
dc.contributor.authorVenkatesan, T.
dc.contributor.authorTen Elshof, J.E.
dc.date.accessioned2014-06-17T02:54:43Z
dc.date.available2014-06-17T02:54:43Z
dc.date.issued2013-03-11
dc.identifier.citationGeorge, A., Mathew, S., Van Gastel, R., Nijland, M., Gopinadhan, K., Brinks, P., Venkatesan, T., Ten Elshof, J.E. (2013-03-11). Large area resist-free soft lithographic patterning of graphene. Small 9 (5) : 711-715. ScholarBank@NUS Repository. https://doi.org/10.1002/smll.201201889
dc.identifier.issn16136810
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/56450
dc.description.abstractLarge area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications. Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1002/smll.201201889
dc.sourceScopus
dc.subjectgraphene
dc.subjectpatterning
dc.subjectplasma etching
dc.subjectresist-free patterning
dc.subjectsoft lithography
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1002/smll.201201889
dc.description.sourcetitleSmall
dc.description.volume9
dc.description.issue5
dc.description.page711-715
dc.description.codenSMALB
dc.identifier.isiut000315769700010
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