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|Title:||A parametric study on surface roughness evaluation of semi-conductor wafers by laser scattering||Authors:||Tay, C.J.
|Issue Date:||2003||Citation:||Tay, C.J.,Quan, C. (2003). A parametric study on surface roughness evaluation of semi-conductor wafers by laser scattering. Optik (Jena) 114 (1) : 1-6. ScholarBank@NUS Repository.||Abstract:||A technique for measuring surface roughness of semi-conductor wafers in the nanometer range has been developed. The principle of the method is based on laser scattering from a rough surface. A tele-centric optical set-up is constructed to illuminate the test specimens and the scattered light field is recorded with a photo-diode sensor connected to a digital amplifier. A parametric method is proposed for the evaluation technique and results obtained are compared with those obtained using a conventional Taylor Hobson mechanical stylus profilometer. A set of roughness standards fabricated in accordance with BS 2634 and ISO 2632 is employed in the calibration process.||Source Title:||Optik (Jena)||URI:||http://scholarbank.nus.edu.sg/handle/10635/54691||ISSN:||00304026|
|Appears in Collections:||Staff Publications|
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