Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.mser.2006.10.001
DC FieldValue
dc.titleNanoscale materials patterning and engineering by atomic force microscopy nanolithography
dc.contributor.authorXie, X.N.
dc.contributor.authorChung, H.J.
dc.contributor.authorSow, C.H.
dc.contributor.authorWee, A.T.S.
dc.date.accessioned2014-05-19T02:57:24Z
dc.date.available2014-05-19T02:57:24Z
dc.date.issued2006-11-01
dc.identifier.citationXie, X.N., Chung, H.J., Sow, C.H., Wee, A.T.S. (2006-11-01). Nanoscale materials patterning and engineering by atomic force microscopy nanolithography. Materials Science and Engineering R: Reports 54 (1-2) : 1-48. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mser.2006.10.001
dc.identifier.issn0927796X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/53348
dc.description.abstractThis review article aims to provide an updated and comprehensive description on the development of atomic force microscopy (AFM) nanolithography for structuring and fabrication at the nanometer scale. The many AFM nanolithographic techniques are classified into two general groups of force-assisted and bias-assisted nanolithography on the basis of their mechanistic and operational principles. Force-assisted AFM nanolithography includes mechanical indentation and plowing, thermomechanical writing, manipulation and dip-pen nanolithography. Bias-assisted AFM nanolithography encompasses probe anodic oxidation, field evaporation, electrochemical deposition and modification, electrical cutting and nicking, electrostatic deformation and electrohydrodynamic nanofluidic motion, nanoexplosion and shock wave generation, and charge deposition and manipulation. The experimental procedures, pattern formation mechanisms, characteristics, and functionality of nanostructures and nanodevices fabricated by AFM nanolithography are reviewed. The capabilities of AFM nanolithography in patterning a large family of materials ranging from single atoms and molecules to large biological networks are presented. Emphasis is given to AFM nanolithographic techniques such as dip-pen nanolithography, probe anodic oxidation, etc. due to the rapid progress and wide applications of these techniques. © 2006 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.mser.2006.10.001
dc.sourceScopus
dc.subjectAnodic oxidation
dc.subjectAtomic force microscopy
dc.subjectAtomic force microscopy nanolithography
dc.subjectDip-pen nanolithography
dc.subjectNanolithography
dc.subjectScanning force microscopy
dc.typeReview
dc.contributor.departmentNUS NANOSCIENCE & NANOTECH INITIATIVE
dc.contributor.departmentPHYSICS
dc.description.doi10.1016/j.mser.2006.10.001
dc.description.sourcetitleMaterials Science and Engineering R: Reports
dc.description.volume54
dc.description.issue1-2
dc.description.page1-48
dc.description.codenMIGIE
dc.identifier.isiut000243844700001
Appears in Collections:Staff Publications

Show simple item record
Files in This Item:
There are no files associated with this item.

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.