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|Title:||Low dielectric constant a-SiOC:H films as copper diffusion barrier||Authors:||Koh, Y.W.
|Issue Date:||15-Jan-2003||Citation:||Koh, Y.W., Loh, K.P., Rong, L., Wee, A.T.S., Huang, L., Sudijono, J. (2003-01-15). Low dielectric constant a-SiOC:H films as copper diffusion barrier. Journal of Applied Physics 93 (2) : 1241-1245. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1530722||Abstract:||The development of a low-K dielectric barrier based on silicon oxycarbide for copper damascence processes was discussed. The optimal process conditions allowing the deposition of silicon oxycarbide films with a dielectric constant of 3.74 and copper diffusion depth of 290 Å were identified. The composition of the films was studied and dielectric constant and dielectric breakdown of the films was also evaluated.||Source Title:||Journal of Applied Physics||URI:||http://scholarbank.nus.edu.sg/handle/10635/53016||ISSN:||00218979||DOI:||10.1063/1.1530722|
|Appears in Collections:||Staff Publications|
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