Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.3629812
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dc.titleChemical vapor deposition graphene as structural template to control interfacial molecular orientation of chloroaluminium phthalocyanine
dc.contributor.authorYing Mao, H.
dc.contributor.authorWang, R.
dc.contributor.authorWang, Y.
dc.contributor.authorChao Niu, T.
dc.contributor.authorQiang Zhong, J.
dc.contributor.authorYang Huang, M.
dc.contributor.authorChen Qi, D.
dc.contributor.authorPing Loh, K.
dc.contributor.authorThye Shen Wee, A.
dc.contributor.authorChen, W.
dc.date.accessioned2014-04-25T09:03:45Z
dc.date.available2014-04-25T09:03:45Z
dc.date.issued2011-08-29
dc.identifier.citationYing Mao, H., Wang, R., Wang, Y., Chao Niu, T., Qiang Zhong, J., Yang Huang, M., Chen Qi, D., Ping Loh, K., Thye Shen Wee, A., Chen, W. (2011-08-29). Chemical vapor deposition graphene as structural template to control interfacial molecular orientation of chloroaluminium phthalocyanine. Applied Physics Letters 99 (9) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3629812
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/51763
dc.description.abstractChemical vapor deposition (CVD) graphene has been used as an effective structural template to manipulate molecular orientation of organic thin film of chloroaluminium phthalocyanine (ClAlPc) on indium tin oxide (ITO) electrode. As revealed by in-situ near-edge x-ray adsorption fine structure measurement, ClAlPc molecules on the CVD graphene modified ITO electrode adopt a well-aligned lying-down configuration with their molecular -plane nearly parallel to the electrode surface, in contrast to the random orientation of ClAlPc molecules on the bare ITO electrode. This lying-down configuration results in an optimized stacking of the molecular -plane perpendicular to the electrode surface and hence facilitates efficient charge transport along this direction. © 2011 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.3629812
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.contributor.departmentCHEMISTRY
dc.contributor.departmentCHEMICAL & BIOMOLECULAR ENGINEERING
dc.description.doi10.1063/1.3629812
dc.description.sourcetitleApplied Physics Letters
dc.description.volume99
dc.description.issue9
dc.description.page-
dc.description.codenAPPLA
dc.identifier.isiut000294489300065
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