Please use this identifier to cite or link to this item: https://doi.org/10.1002/adma.201004519
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dc.titleMutual ferromagnetic-ferroelectric coupling in multiferroic copper-doped ZnO
dc.contributor.authorHerng, T.S.
dc.contributor.authorWong, M.F.
dc.contributor.authorQi, D.
dc.contributor.authorYi, J.
dc.contributor.authorKumar, A.
dc.contributor.authorHuang, A.
dc.contributor.authorKartawidjaja, F.C.
dc.contributor.authorSmadici, S.
dc.contributor.authorAbbamonte, P.
dc.contributor.authorSánchez-Hanke, C.
dc.contributor.authorShannigrahi, S.
dc.contributor.authorXue, J.M.
dc.contributor.authorWang, J.
dc.contributor.authorFeng, Y.P.
dc.contributor.authorRusydi, A.
dc.contributor.authorZeng, K.
dc.contributor.authorDing, J.
dc.date.accessioned2014-04-24T09:35:28Z
dc.date.available2014-04-24T09:35:28Z
dc.date.issued2011-04-12
dc.identifier.citationHerng, T.S., Wong, M.F., Qi, D., Yi, J., Kumar, A., Huang, A., Kartawidjaja, F.C., Smadici, S., Abbamonte, P., Sánchez-Hanke, C., Shannigrahi, S., Xue, J.M., Wang, J., Feng, Y.P., Rusydi, A., Zeng, K., Ding, J. (2011-04-12). Mutual ferromagnetic-ferroelectric coupling in multiferroic copper-doped ZnO. Advanced Materials 23 (14) : 1635-1640. ScholarBank@NUS Repository. https://doi.org/10.1002/adma.201004519
dc.identifier.issn09359648
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/51471
dc.description.abstractA mutual ferromagnetic and ferroelectric coupling (multiferroic behavior) in Cu-doped ZnO is demonstrated via deterministic control of Cu doping and defect engineering. The coexistence of multivalence Cu ions and oxygen vacancies is important to multiferroic behaviors in ZnO:Cu. The samples show clear ferroelectric and ferromagnetic domain patterns. These domain structures may be written reversibly via electric and magnetic bias. © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1002/adma.201004519
dc.sourceScopus
dc.subjectferroelectric materials
dc.subjectmagnetic materials
dc.subjectmultiferroic materials
dc.subjectthin films
dc.subjectzinc oxide
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.contributor.departmentMECHANICAL ENGINEERING
dc.description.doi10.1002/adma.201004519
dc.description.sourcetitleAdvanced Materials
dc.description.volume23
dc.description.issue14
dc.description.page1635-1640
dc.description.codenADVME
dc.identifier.isiut000289211600007
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