Microlens array fabrication by laser interference lithography for super-resolution surface nanopatterning

Abstract

A technique for large area and fast speed surface nanopatterning of photopolymer surface with laser irradiation through microlens array (MLA) was demonstrated. The laser beam was split into many focused tiny light spots by a 1 μm diameter MLA fabricated by laser interference lithography followed by reflow and reactive ion etching. The fabricated MLA exhibits excellent uniformity and surface quality. Up to 6 250 000 nanopatterns can be fabricated over an area of 5×5 mm2 under KrF excimer laser single pulse exposure. A spot size down to 78 nm was obtained corresponding to super-resolution of λ3, λ is the incident laser wavelength. © 2006 American Institute of Physics.