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https://scholarbank.nus.edu.sg/handle/10635/43443
Title: | Methods for enhancing photolithography patterning | Authors: | LING, MOH LUNG CHUA, GEK SOON LIN, QUNYING TAY, CHO JUI QUAN, CHENGGEN |
Issue Date: | 28-May-2013 | Citation: | LING, MOH LUNG,CHUA, GEK SOON,LIN, QUNYING,TAY, CHO JUI,QUAN, CHENGGEN (2013-05-28). Methods for enhancing photolithography patterning. ScholarBank@NUS Repository. | Abstract: | A method for fabricating a semiconductor device that includes: providing a substrate prepared with a photoresist layer; providing a photomask comprising a first and a second pattern having a respective first and second pitch range; providing a composite aperture comprising a first and a second off-axis illumination aperture pattern, the first off-axis aperture pattern having a configuration that improves the process window of the first pitch range and the second off-axis aperture pattern having a configuration that improves the process window for a second pitch range; exposing the photoresist layer on the substrate with radiation from an exposure source through the composite aperture and the photomask; and developing the photoresist layer to pattern the photoresist layer. | URI: | http://scholarbank.nus.edu.sg/handle/10635/43443 |
Appears in Collections: | Staff Publications |
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