Thermal and photo-induced oxidation reaction on silicon and copper surfaces

Abstract

In this thesis, the thermal and photo-induced oxidation reaction on silicon and copper surfaces were studied by using various experimental and theoretical technologies, including X-ray photoelectron spectroscopy (XPS), high-resolution electron energy loss spectroscopy (HREELS) and density functional theory (DFT) calculations. O2 and CO2 are selected as the probe to adsorb onto the clean silicon surfaces, acetylene modified silicon surfaces and clean copper surfaces, and the results demonstrate that there will be different oxidation reactions on surfaces with thermal or photon activations.