Please use this identifier to cite or link to this item:
https://doi.org/10.1364/oe.419255
DC Field | Value | |
---|---|---|
dc.title | Design and fabrication of high-performance multimode interferometer in lithium niobate thin film | |
dc.contributor.author | Chen, Guanyu | |
dc.contributor.author | da Ng, Jun | |
dc.contributor.author | Lin, Hong-Lin | |
dc.contributor.author | Zhang, Gong | |
dc.contributor.author | Gong, Xiao | |
dc.contributor.author | Danner, Aaron J. | |
dc.date.accessioned | 2022-10-12T08:06:33Z | |
dc.date.available | 2022-10-12T08:06:33Z | |
dc.date.issued | 2021-05-07 | |
dc.identifier.citation | Chen, Guanyu, da Ng, Jun, Lin, Hong-Lin, Zhang, Gong, Gong, Xiao, Danner, Aaron J. (2021-05-07). Design and fabrication of high-performance multimode interferometer in lithium niobate thin film. Optics Express 29 (10) : 15689-15698. ScholarBank@NUS Repository. https://doi.org/10.1364/oe.419255 | |
dc.identifier.issn | 1094-4087 | |
dc.identifier.uri | https://scholarbank.nus.edu.sg/handle/10635/232468 | |
dc.description.abstract | We propose and demonstrate a type of high-performance transverse magnetic (TM) multimode interferometer (MMI) in Z-cut thin film lithium niobate (TFLN). Both 1 × 2 and 4 × 4 MMI designs are demonstrated. Simulation results show that the insertion losses (ILs) are nominally about 0.157 and 0.297 dB for the 1 × 2 and 4 × 4 MMI, respectively, with wide fabrication tolerances. Based on the designed structure, the MMIs are fabricated using an argon based induced coupled plasma (ICP) etching method in Z-cut TFLN. The measured ILs are 0.268 and 0.63 dB for these two kinds of devices. The presented TM mode MMI featuring compact size and low loss can be used for both multifunctional devices and on-chip integrated circuits on a Z-cut TFLN platform. © 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement | |
dc.publisher | The Optical Society | |
dc.rights | Attribution 4.0 International | |
dc.rights.uri | https://creativecommons.org/licenses/by/4.0/ | |
dc.source | Scopus OA2021 | |
dc.type | Article | |
dc.contributor.department | DEPT OF ELECTRICAL & COMPUTER ENGG | |
dc.contributor.department | NUS INFORMATION TECHNOLOGY | |
dc.contributor.department | COLLEGE OF DESIGN AND ENGINEERING | |
dc.description.doi | 10.1364/oe.419255 | |
dc.description.sourcetitle | Optics Express | |
dc.description.volume | 29 | |
dc.description.issue | 10 | |
dc.description.page | 15689-15698 | |
Appears in Collections: | Elements Staff Publications |
Show simple item record
Files in This Item:
File | Description | Size | Format | Access Settings | Version | |
---|---|---|---|---|---|---|
10_1364_oe_419255.pdf | 5.34 MB | Adobe PDF | OPEN | None | View/Download |
This item is licensed under a Creative Commons License