A STUDY ON THE DEVELOPMENT OF ATMOSPHERIC-PRESSURE PLASMA TECHNIQUE FOR SURFACE MODIFICATION

Abstract

The present study starts with the development of AP plasma surface modification machine. Three types of AP plasma configurations, including linear direct type, linear remote type plasma, and AP plasma jet, have been designed to apply on single-crystal silicon (Si) wafer and carbon fiber reinforced polymers (CFRPs). Fundamental study and parameter investigation have been conducted in detail to build the machine capability. Surface modification by electrochemical oxidation has also been proposed as another method for Si wafers.