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Title: Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS2 using multiphoton microscopy
Authors: Woodward, R.I
Murray, R.T
Phelan, C.F
De Oliveira, R.E.P
Runcorn, T.H
Kelleher, E.J.R
Li, S 
De Oliveira, E.C
Fechine, G.J.M
Eda, G 
De Matos, C.J.S
Keywords: Harmonic analysis
Harmonic generation
Layered semiconductors
Molybdenum compounds
Nonlinear optics
Optical properties
Multi-photon microscopy
Non-linear optical properties
Nonlinear susceptibilities
Second and third harmonics
Surface nonlinear optics
Third order nonlinear optical susceptibility
Two Dimensional (2 D)
Sulfur compounds
Issue Date: 2017
Citation: Woodward, R.I, Murray, R.T, Phelan, C.F, De Oliveira, R.E.P, Runcorn, T.H, Kelleher, E.J.R, Li, S, De Oliveira, E.C, Fechine, G.J.M, Eda, G, De Matos, C.J.S (2017). Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS2 using multiphoton microscopy. 2D Materials 4 (1) : 11006. ScholarBank@NUS Repository.
Rights: Attribution 4.0 International
Abstract: We report second- and third-harmonic generation in monolayer MoS2 as a tool for imaging and accurately characterizing the material's nonlinear optical properties under 1560 nm excitation. Using a surface nonlinear optics treatment, we derive expressions relating experimental measurements to second- and third-order nonlinear sheet susceptibility magnitudes, obtaining values of |?s (2)| = 2.0 × 10-20 m2 V-1 and, for the first time for monolayer MoS2, |?s (3)| = 1.7 × 10-28 m3 V-2. These sheet susceptibilities correspond to effective bulk nonlinear susceptibility values of |?b (2)| = 2.9 × 10-11 m V-1 and |?b (3)| = 2.4 × 10-19 m2 V-2, accounting for the sheet thickness. Experimental comparisons between MoS2 and graphene are also performed, demonstrating ?3.4 times stronger third-order sheet nonlinearity in monolayer MoS2, highlighting the material's potential for nonlinear photonics in the telecommunications C band. © 2016 IOP Publishing Ltd.
Source Title: 2D Materials
ISSN: 20531583
DOI: 10.1088/2053-1583/4/1/011006
Rights: Attribution 4.0 International
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