PREPARATION AND CHARACTERIZATION OF REACTIVE RF SPUTTERED NITRIDE THIN FILMS

Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/159230

DC Field	Value
dc.title	PREPARATION AND CHARACTERIZATION OF REACTIVE RF SPUTTERED NITRIDE THIN FILMS
dc.contributor.author	CHEN GEOK LOO
dc.date.accessioned	2019-09-16T02:58:33Z
dc.date.available	2019-09-16T02:58:33Z
dc.date.issued	1999
dc.identifier.citation	CHEN GEOK LOO (1999). PREPARATION AND CHARACTERIZATION OF REACTIVE RF SPUTTERED NITRIDE THIN FILMS. ScholarBank@NUS Repository.
dc.identifier.uri	https://scholarbank.nus.edu.sg/handle/10635/159230
dc.source	CCK BATCHLOAD 20190911
dc.type	Thesis
dc.contributor.department	PHYSICS
dc.contributor.supervisor	LI YI
dc.contributor.supervisor	LIN JIANYI
dc.description.degree	Master's
dc.description.degreeconferred	MASTER OF SCIENCE
Appears in Collections:	Master's Theses (Restricted)

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