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Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/153882
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dc.titleTITANIUM NITRIDE FILM DEPOSITED REACTIVE DC MAGNETRON SPUTTERING
dc.contributor.authorZOU TING
dc.date.accessioned2019-05-09T04:10:18Z
dc.date.available2019-05-09T04:10:18Z
dc.date.issued2006
dc.identifier.citationZOU TING (2006). TITANIUM NITRIDE FILM DEPOSITED REACTIVE DC MAGNETRON SPUTTERING. ScholarBank@NUS Repository.
dc.identifier.urihttps://scholarbank.nus.edu.sg/handle/10635/153882
dc.description.abstractTitanium nitride (TiNx) thin film is interesting to be considered as a diffusion barrier in GaN-based LEDs when device dimensions scale down. This thesis studied the film properties of TiN thin layers deposited onto Si substrate by reactive dc magnetron sputtering varying deposition temperature and nitrogen flow rate, and tried to find optimum growth conditions. Crystal structure, surface morphology and roughness, hardness and adhesion were well examined on TiN films grown in various conditions via kinds of characterization facilities.
dc.sourceSMA BATCHLOAD 20190422
dc.subjectTitanium nitride (TiN)
dc.subjectthin film
dc.subjectreactive dc magnetron sputtering
dc.subjectdeposition temperature
dc.subjectnitrogen flow rate
dc.subjectcrystal structure
dc.subjectsurface morphology
dc.subjectroughness
dc.subjecthardness and adhesion
dc.typeThesis
dc.contributor.departmentSINGAPORE-MIT ALLIANCE
dc.contributor.supervisorJENNY LAM
dc.contributor.supervisorKANG XUEJUN
dc.contributor.supervisorCHUA SOO JIN
dc.description.degreeMaster's
dc.description.degreeconferredMASTER OF SCIENCE IN ADVANCED MATERIALS FOR MICRO- & NANO- SYSTEMS
dc.description.otherDissertation Supervisors: 1. Dr. Jenny Lam, Tinggi Technologies 2. Dr. Kang Xuejun, Tinggi Technologies 3. Prof. Chua Soo Jin, SMA Fellow, NUS
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