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|Title:||Optical and mechanical properties of Cu-Al-O thin films prepared by plasma-enhance CVD||Authors:||CHEN WEN||Keywords:||Cu-Al-O, Optical property, Mechanical property||Issue Date:||6-Apr-2005||Citation:||CHEN WEN (2005-04-06). Optical and mechanical properties of Cu-Al-O thin films prepared by plasma-enhance CVD. ScholarBank@NUS Repository.||Abstract:||Copper aluminium oxide thin films were prepared by plasma-enhanced CVD. The optical and mechanical properties of the films were investigated by the Z-scan technique and nanoindentation. Upon laser bombardment, the film experienced optical annealing and the film transmittance increased. Such an optical response of the film may be useful in optical processing and data storage. Nanoindentation measurement showed that film strength decreased with substrate temperature and Cu/Al ratio. The strongest film has a hardness of 12.1 GPa and an elastic modulus of 120.1 GPa. Structural and compositional analysis revealed that fine Al2O3 grains contributed mostly to strengthen the films whereas particle size hardening also took some effect. The study provided knowledge necessary for making transparent conductive oxide devices with high durability and long lifetime.||URI:||http://scholarbank.nus.edu.sg/handle/10635/14579|
|Appears in Collections:||Master's Theses (Open)|
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