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|Title:||Run-to-run control in semiconductor manufacturing||Authors:||VARADARAJAN GANESH KUMAR||Keywords:||RUN-TO-RUN, CMP, SEMICONDUCTOR MANUFACTURING, APC, EWMA, ADAPTIVE CONTROL||Issue Date:||8-Nov-2003||Citation:||VARADARAJAN GANESH KUMAR (2003-11-08). Run-to-run control in semiconductor manufacturing. ScholarBank@NUS Repository.||Abstract:||Semiconductor manufacturing processes like chemical mechanical polishing (CMP) and photolithography has become an indispensable processing module used in fabrication facilities worldwide. The lack of in-situ measurements of the product qualities of interest, in this case, the surface thickness uniformity, makes run-to-run control the only viable scheme in most semiconductor manufacturing processes. The literature contains many variations of run-to-run control schemes to control the CMP process. In this thesis, we analyze the performance of these run-to-run control schemes and propose a self-tuning predictor-corrector controller (PCC). A 25% improvement in performance is observed in comparison with the other schemes.||URI:||http://scholarbank.nus.edu.sg/handle/10635/13463|
|Appears in Collections:||Master's Theses (Open)|
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